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High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation

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2 Author(s)
Matsumoto, Takahiro ; Res. & Dev. Center, Stanley Electr. Co., Yokohama, Japan ; Mimura, H.

High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation were investigated. We introduce a new nanometer-sized tailored cathode that can be made by simple etching of nano-craters onto a graphite substrate.

Published in:
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Date of Conference: 29-31 Oct. 2003

Print ISBN:
4-89114-040-2
INSPEC Accession Number:
7947664
Digital Object Identifier :
10.1109/IMNC.2003.1268640
Product Type:
Conference Publications

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