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A detection method for a T-topped profile in resist patterns by top-down-view CD-SEM

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5 Author(s)
Yamaguchi, A. ; Central Res. Lab., Hitachi Ltd., Tokyo, Japan ; Fukuda, H. ; Komuro, O. ; Yoneda, S.
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In this paper, we have evaluated the characteristics of T-topped patterns with LER, the width of the white band, and a correlation coefficient between the left and right borders of the white band. It can be concluded that the evaluation of these features enables us to recognize a T-topped profile of a resist-pattern edge from only one top-down image by CD-SEM.

Published in:

Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Date of Conference:

29-31 Oct. 2003

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