By Topic

A detection method for a T-topped profile in resist patterns by top-down-view CD-SEM

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Yamaguchi, A. ; Central Res. Lab., Hitachi Ltd., Tokyo, Japan ; Fukuda, H. ; Komuro, O. ; Yoneda, S.
more authors

In this paper, we have evaluated the characteristics of T-topped patterns with LER, the width of the white band, and a correlation coefficient between the left and right borders of the white band. It can be concluded that the evaluation of these features enables us to recognize a T-topped profile of a resist-pattern edge from only one top-down image by CD-SEM.

Published in:

Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Date of Conference:

29-31 Oct. 2003