By Topic

Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)

This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.

Published in:

IEEE Transactions on Semiconductor Manufacturing  (Volume:17 ,  Issue: 1 )