The Gamma function is proposed to approximate the measured lithographic defect size distribution for the estimation of the chip critical area. It is shown that, compared to the commonly used 1/x3 function for approximation of the lithographic defect size distribution, the Gamma function provides much better agreement with the measured data, thus leading to a more accurate estimation of the chip critical area.
Published in:
Electronics Letters
(Volume:28
,
Issue:
6
)
Date of Publication: 12 March 1992