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Vertically integrated high-silica channel waveguides on Si

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2 Author(s)
Barbarossa, G. ; Dept. of Electron. & Electr. Eng., Glasgow Univ., UK ; Laybourn, P.J.R.

For the first time the vertical integration of high-silica content low-loss channel waveguide on an Si substrate is reported. The fabrication process, which has made the vertical integration feasible, consists of a practical multistep combination of flame hydrolysis deposition (FHD), photolithographic patterning and reactive ion etching. The successful application to a double integration of singlemode waveguides at 1.55 mu m is also reported. This result, which has been possible thanks to the FHD peculiarities, by extending the optical interaction to a third dimension, opens a wide range of original and promising applications, such as vertically coupled devices or parallel optical signal processors, and it effectively increases the density of optical guided-wave functions available on the same substrate.

Published in:

Electronics Letters  (Volume:28 ,  Issue: 5 )