Cart (Loading....) | Create Account
Close category search window
 

Energy contamination control during ion beam deceleration for low energy ion implantation

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)

Ultra low energy ion implantation with high beam current is required for shallow junction formation. Due to space charge limits in low energy ion beam transport, it is necessary to extract ion beams at higher energy (>1 kV) and decelerate them to a target energy as low as 100 eV near the process wafers. Energy contamination due to energetic neutral particles that result from charge exchanges between beam ions and bean-dine residual gas molecules before and during deceleration, increases proportionally with beamline pressure and is difficult to be prevented without sacrificing beam currents substantially. AIBT has developed a method or energy contamination control. Both electrical and magnetic fields are applied to the deceleration region so that the energetic neutral particles created before and during beam deceleration are guided to neutral beam blockers instead of the wafers. The energy contamination is negligible though the beamline pressure is as high as 1E-4torr. This method maximizes beam current performance at ultra low energy and gives easy implant control since the beamline pressure does not affect energy contamination level in our system.

Published in:

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on

Date of Conference:

27-27 Sept. 2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.