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Adjustment of laser facet film reflectivity by ablation etching

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5 Author(s)
Takeshita, T. ; NTT Photonics Labs., NTT Corp., Kanagawa, Japan ; Sugo, Mitsuru ; Shibata, Y. ; Kamioka, H.
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We demonstrate reflectivity adjustment of a film-coated laser facet using ablation etching. The lasing is restrained by laser ablation etching of the facet film of a semiconductor laser and starts again with additional laser ablation etching. The laser ablation etching is useful not only for identifying more than λ0/(4nfilm) thickness of the coated film but also for adjusting facet coating thickness.

Published in:

Photonics Technology Letters, IEEE  (Volume:16 ,  Issue: 1 )