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Amplitude-phase-shift masks for projection lithography of submicron technology

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1 Author(s)

Submicrometer optical lithography is possible with conventional projection cameras when the mask controls the phase of the light at the object plane. The phase shifting mask consists of a normal transmission mask that has been with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite. Thus the phase-shifting mask may be the most desirable device for enhancing optical lithography resolution in the VLSI era.

Published in:

CAD Systems in Microelectronics, 2003. CADSM 2003. Proceedings of the 7th International Conference. The Experience of Designing and Application of

Date of Conference:

18-22 Feb. 2003