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The overview of scanning probe lithography by electron beam exposure of organic resists

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5 Author(s)
Zhang, L.B. ; Coll. of Mech. & Electr. Eng., Zhejiang Univ. of Technol., Hangzhou, China ; Shi, J.X. ; Yuan, J.L. ; Chang, M.
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SPM-based lithography, referred to as Scanning Probe Lithography (SPL), is compatible with a wide range of surfaces, including organic resists. SPL by means of electron beam exposure of types of organic resists using STM or conducting AFM is described in this review. The emphasis is placed on the qualitative analyses of the factors in affecting exposure resolution, which include the properties of organic resists, exposure dose, underlying substrates and tip materials, and relative humidity. On the basis of the foresaid analyses, the tip-sample bias is considered to be a crucial factor in the successful application of this SPL and the tendency of the research concerned is proposed.

Published in:

Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on  (Volume:2 )

Date of Conference:

12-14 Aug. 2003

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