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Optimization of optical disk mastering process using electron beam recorder

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5 Author(s)
Chen, C.Y. ; Nano Technol. Eng. Dept., Ind. Technol. Res. Inst., Hsinchu, Taiwan ; Tsai, H.Y. ; Su, C.C. ; Lin, H.H.
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A master of an optical disk for next generation, HD-DVD, was fabricated by an electron beam mastering system with robust design method to find out the optimal process parameters. In the current study, a negative resist with high sensitivity, SAL601, was used, and was exposed by an electron beam recorder, obducat, EBR200. Many mastering parameters such as acceleration voltage, beam current, linear velocity while recording, baking process and other uncontrollable factors were all considered simultaneously. The implication of the robust design data was also discussed in detail. Furthermore, the influences of each control factors upon the optical disk mastering process were disclosed as well. Finally, the effective and optimal parameters of the mastering process are also shown.

Published in:

Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on  (Volume:2 )

Date of Conference:

12-14 Aug. 2003