Referenced Items are not available for this document.
Summary form only given, as follows. The 3.3 kJ dense plasma focus (DPF) device is used to deposit diamond-like carbon (DLC) thin films on corning and silicon substrates by ablating the high purity graphite anode. For deposition of DLC thin films, the conventional central hollow copper anode is fitted with a solid graphite top, which is 3 cm long.
Published in:
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Date of Conference: 5-5 June 2003
- ISSN :
- 0730-9244
- Print ISBN:
- 0-7803-7911-X
- INSPEC Accession Number:
- 7797289
- Conference Location :
- Jeju, South Korea
- Digital Object Identifier :
- 10.1109/PLASMA.2003.1230048
- Product Type:
- Conference Publications
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