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Enhanced hot-carrier induced degradation in pMOSFETs stressed under high gate voltage

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3 Author(s)
Chen, J.F. ; Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan ; Tsao, Chih-Pin ; Ong, T.C.

Enhanced hot-carrier induced drain current degradation under high gate voltage stress is observed in pMOSFETs. Electron tunneling from the gate plus Auger recombination assisted hot-hole energy gain process is responsible for this phenomenon. This enhancement in drain current degradation is more severe for devices with thinner gate oxide, or devices operated under higher temperature or lower drain voltage.

Published in:

University/Government/Industry Microelectronics Symposium, 2003. Proceedings of the 15th Biennial

Date of Conference:

30 June-2 July 2003