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Diffusion barrier cladding in Si/SiGe resonant interband tunneling diodes and their patterned growth on PMOS source/drain regions

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15 Author(s)
Niu Jin ; Dept. of Electr. Eng., Ohio State Univ., Columbus, OH, USA ; Chung, Sung-Yong ; Rice, A.T. ; Berger, Paul R.
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Si/SiGe resonant interband tunnel diodes (RITDs) employing δ-doping spikes that demonstrate negative differential resistance (NDR) at room temperature are presented. Efforts have focused on improving the tunnel diode peak-to-valley current ratio (PVCR) figure-of-merit, as well as addressing issues of manufacturability and CMOS integration. Thin SiGe layers sandwiching the B δ-doping spike used to suppress B out-diffusion are discussed. A room-temperature PVCR of 3.6 was measured with a peak current density of 0.3 kA/cm2. Results clearly show that by introducing SiGe layers to clad the B δ-doping layer, B diffusion is suppressed during post-growth annealing, which raises the thermal budget. A higher RTA temperature appears to be more effective in reducing defects and results in a lower valley current and higher PVCR. RITDs grown by selective area molecular beam epitaxy (MBE) have been realized inside of low-temperature oxide openings, with performance comparable with RITDs grown on bulk substrates.

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Electron Devices, IEEE Transactions on  (Volume:50 ,  Issue: 9 )