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Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters

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5 Author(s)
Hao Ren ; State Key Lab. of Optoelectron. Mater & Technol.., Sun Yat-Sen Univ., Guangzhou, China ; Deng, S.Z. ; Jun Chen ; She, J.C.
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In this report, we introduce an ion reactive plasma etching treatment to modify the field emission properties of screen-printed CNT thick film field emitters. The surface morphology was examined using scanning electron microscopy.

Published in:

Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International

Date of Conference:

7-11 July 2003