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Low temperature carbon nanotubes for field emission display

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8 Author(s)
Kang, S. ; cDream Corp., San Jose, CA, USA ; Bae, C. ; Son, W. ; Kim, M.H.
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In this article, we developed low temperature CNT growing technology between 470-500/spl deg/C with the glass substrate used in TFT-LCD industry by inductively coupled plasma chemical vapour deposition (ICPCVD).

Published in:

Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International

Date of Conference:

7-11 July 2003