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The dynamic structure of dual frequency (2/60 MHz) capacitively coupled plasmas (CCPs) in Ar (25 mtorr) are examined using the self-consistent particle-in-cell/Monte Carlo (PIC/MC) simulation. At first, the dependence of the discharge structure on wafer biasing conditions were investigated using one-dimensional computation. The results show that the plasma potential oscillates with the high frequency superposed on the low frequency. The amplitude of the high-frequency oscillation is modulated by the instantaneous potential of the low frequency biasing electrode. Furthermore, the axisymmetrical two-dimensional PIC/MC simulation is performed to investigate the influence of a geometric configuration of the reactor on the plasma structure.