By Topic

Photolithography on optical fiber and micro-fabrication of fiber-optic devices controlling evanescent field

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
K. Hane ; Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan ; J. -H. Song ; M. Sasaki ; Y. Taguchi
more authors

New photolithographic fabrications of micro fiber-optic devices for telecommunication are reported. A variable attenuator and a tunable filter have been designed based on an evanescent field interaction. The devices have been fabricated by applying surface and bulk micromachining to the optical fiber fixed on the Si substrate. Since the optical fiber is side-polished, the light wave interacts through evanescent field with micro Si structures fabricated on the optical fiber. The initial optical properties in light attenuation and wavelength dependent transmittance have been measured. The proposed fabrication technique will enable a new type of fiber optic devices in telecommunication.

Published in:

TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003  (Volume:1 )

Date of Conference:

8-12 June 2003