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The origination and optimization of Si/SiO2 interface roughness and its effect on CMOS performance

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5 Author(s)
Yuanning Chen ; VLSI Process. Dev., Agere Syst., Orlando, FL, USA ; Myricks, R. ; Decker, M. ; Liu, J.
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As CMOS device dimensions scale down to 100 nm and beyond, the interface roughness between Si and SiO2 has become critical to device performance and reliability. Si/SiO2 interface roughness degrades channel mobility decreasing drive currents. The authors have used atomic force microscopy to study surface roughness in the processing of 0.16 μm CMOS integrated circuits. All of the process steps that could potentially affect the interface roughness have been studied. The results show that oxidation is the major contributor to the interface roughness. The rms roughness is found to be linearly dependent on oxide thickness. Transistors with Si/SiO2 interface rms roughness that has been reduced from 1.6 to 1.1 /spl Aring/ by reducing oxide thicknesses show improved device drive currents. This technique for interfacial smoothing and device performance improvement has the advantage of being easily implemented in today's technology.

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Electron Device Letters, IEEE  (Volume:24 ,  Issue: 5 )