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This paper examines the high-frequency behavior of the enhancement-mode pseudomorphic high electron-mobility transistor (epHEMT) gate. During this study, no bias was applied between the drain and source. Rather, the gate was forward biased with either the drain, source, or channel (drain and source connected together) grounded. While applying positive voltage Vg to the gate, one-port S-parameters were measured from 0.1 to 10 GHz and then converted to Z-parameters. Plotting the real part R of the impedance reveals two sharp peaks. The first peak occurs near the device threshold voltage for conduction in the InGaAs well. A second peak occurs at higher voltages where conduction begins to occur in the surface AlGaAs layer. An equivalent-circuit model is proposed to account for the epHEMT gate's high-frequency behavior and the proposed model is shown to be in good agreement with the experimental data.