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Athermalization of a silica-based waveguide with a UV-induced Bragg grating on a crystallized glass substrate

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5 Author(s)
Kintaka, K. ; Photonics Res. Inst., Nat. Inst. of Adv. Ind. Sci. & Technol., Ikeda, Japan ; Nishii, J. ; Nishiyama, H. ; Kawamoto, Y.
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To realize athermal glass films, formation of Ge-B-SiO2 and F-B-SiO2 films by plasma-enhanced chemical vapor deposition (PECVD) was examined on several substrates with various thermal expansion coefficients. Waveguide Bragg gratings were fabricated by irradiation with a KrF excimer laser light through a phase mask. A temperature dependence of the Bragg wavelength as low as 4 pm/°C was obtained in a 6GeO2-13B2O3-81SiO2 (mol%) core and 13B2O3-87SiO2 (mol%) cladding waveguide or in a 13B2O3-87SiO2 (mol%) core, 6GeO2-13B2O3-81SiO2 (mol%) grating layer and 6F2-10B2O3-84SiO2 (mol%) cladding waveguide on crystallized glass substrates with a thermal expansion coefficient of -2.0 × 10-6/°C. Such temperature sensitivity is one third of conventional waveguide Bragg grating devices.

Published in:

Lightwave Technology, Journal of  (Volume:21 ,  Issue: 3 )

Date of Publication:

March 2003

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