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Stable interconnect RC model via matching the first two moments

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4 Author(s)
Bin Chen ; Dept. of Electron. & Eng., Tsinghua Univ., Beijing, China ; Huazhong Yang ; Rong Luo ; Hui Wang

Interconnect RC effect has a dominant impact on VLSI performance as the process technology moves towards the sub-micrometer regime. The delays of global interconnects are greater than those of the gates, and the analysis of interconnects becomes indispensable in VLSI design. In this paper, a stable two-pole model is given which matches not only the first two moments as traditional methods do, but adds a zero, in case of unstable conditions being encountered, into the transfer function to improve the stability. The simulation results show that this model can achieve reasonable accuracy.

Published in:

Communications, Circuits and Systems and West Sino Expositions, IEEE 2002 International Conference on  (Volume:2 )

Date of Conference:

29 June-1 July 2002