By Topic

Self alignment technology between microlens focal points and near-field optical nano-probe apertures in 2-D micro-optical disk head

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Goto, K. ; Sch. of High Technol. for Human Welfare, Tokai Univ., Shizuoka, Japan ; Kurihara, K. ; Suzuki, K. ; Nikolov, I.

A new optical memory system is urgently required to realize larger memory capacity and faster data transfer rate for the coming higher speed internet er-a. To overcome the current capacity barrier and the current low data transfer rate barrier in the far-field optical techniques, a novel near-field optical memory of super-parallel evanescent waves has been proposed and is being developed using a vertical cavity surface emitting laser (VCSEL) probe array, which consists of the VCSEL array as a light source and the GaP probe 2D array as the evanescent wave efficient generator. Fabrication and estimation of higher optical throughput for GaP probe array are described with 1.25% high throughput efficiency adopting a newly developed microlens array between the VCSEL output windows and the each GaP nano-probe in the array, where the focal points of each microlens inside the each semiconductor nano-probe are exactly coincident by the newly developed self-alignment technology. An array of up to 10,000 elements had been prepared successfully using the newly developed micro-fabrication processes, including the nano-photolithography, dry etching with ion milling and reactive ion etching processes, and the AR-coating deposition process to the high refractive index material surfaces.

Published in:

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Date of Conference:

6-8 Nov. 2002