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Synthesis of microcrystalline silicon films by plasma enhanced chemical vapor deposition using multiple inductively-coupled-plasma modules with low-inductance antenna

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7 Author(s)
Ebe, A. ; Preventure Program, Japan Sci. & Technol. Corp., Osaka, Japan ; Inami, H. ; Baba, S. ; Yamamoto, N.
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Microcrystalline silicon thin films were prepared on glass substrates at low temperature (400/spl deg/C) by plasma enhanced chemical vapor deposition using an inductively-coupled plasma (ICP) source. The ICP source is equipped with four U-shaped internal low-inductance antenna (LIA) units, which are connected in parallel to an RF power generator at 13.56 MHz via a matching network.

Published in:

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Date of Conference:

6-8 Nov. 2002