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Nanoimprint lithography (NIL) provides a major breakthrough in nanopatterning because it produces nanometer features over a large area with high throughput and low cost. There are a lot of NIL studies, however, all of them are concerned with two dimensional pattern transfers. Fine three-dimensional (3D) fabrication process is now required and studied for various applications such as photonic crystals. In this work, we found out that Spin-On-Glass (SOG) behaves a positive-type-electron-beam (EB) resist using buffered HIP (BHF) development.