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3D imprint technology using SOG mold

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10 Author(s)
Taniguchi, J. ; Tokyo Univ. of Sci., Chiba, Japan ; Iida, M. ; Takezawa, S. ; Kurashima, Y.
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Nanoimprint lithography (NIL) provides a major breakthrough in nanopatterning because it produces nanometer features over a large area with high throughput and low cost. There are a lot of NIL studies, however, all of them are concerned with two dimensional pattern transfers. Fine three-dimensional (3D) fabrication process is now required and studied for various applications such as photonic crystals. In this work, we found out that Spin-On-Glass (SOG) behaves a positive-type-electron-beam (EB) resist using buffered HIP (BHF) development.

Published in:

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Date of Conference:

6-8 Nov. 2002