By Topic

Development of EUV wavefront metrology technology in ASET

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

18 Author(s)
Murakami, K. ; EUV Metrol. Technol. Res. Dept., Assoc. of Super-Adv. Electron. Technol., Kanagawa, Japan ; Saito, J. ; Ota, K. ; Kondo, H.
more authors

Summary form only given, as follows. We examined several wavefront metrology techniques suitable for EUV optics. Problems are lack of high-coherence light source and limitation of applicable optical elements in the EUV wavelength region. To overcome these problems, we adopted point diffraction interferometry (PDI) and shearing interferometry as candidates of metrology method. To verify the idea, we have designed a simple EUV experimental interferometer, which is now under fabrication. The system can be used as both a PDI and a shearing interferometer, with which we will extract issues on wavefront metrology of relatively high-NA EUV optics and will compare the metrology methods. The detailed system design and progress will be presented at the conference.

Published in:

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Date of Conference:

6-8 Nov. 2002