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Nano-lithography using self-assembled block-copolymer for patterned media

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6 Author(s)
Asakawa, K. ; Corporate Res. & Dev. Center, Toshiba Corp., Japan ; Hiraoka, T. ; Hieda, H. ; Sakurai, M.
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Block-copolymers are known to generate nano-scale microdomains by microphase-separation, if they are annealed at a temperature lower than their order-disorder transition temperatures. We tried to transfer microdomains onto substrates by only using the reactive-ion etching method, which is widely used in semiconductor manufacturing processes. Regarding the application of this nano-patterning technique, we demonstrated the first circumferential magnetic patterned media for hard disk, which were prepared on a 2.5-inch diameter glass plate.

Published in:

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Date of Conference:

6-8 Nov. 2002