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Line edge roughness characterization using nanotubed-AFM and SEM

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2 Author(s)
Shin, J. ; Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA ; Cerrina, F.

We report the results of line edge roughness (LER) characterization using atomic force microscopy with carbon nanotube (AFM-CNT) and high resolution scanning electron microscopy (SEM). UV-6 has been exposed using next generation lithography (NGL) tools such as extreme ultra-violet (EUVL), electron beam (EBL), and X-ray (XRL). Then the LER behaviors were compared using AFM-CNT and SEM as metrology tools and we conclude that metrology tools should be selected more carefully for specific applications.

Published in:

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Date of Conference:

6-8 Nov. 2002

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