Cart (Loading....) | Create Account
Close category search window
 

Line edge roughness characterization using nanotubed-AFM and SEM

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Shin, J. ; Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA ; Cerrina, F.

We report the results of line edge roughness (LER) characterization using atomic force microscopy with carbon nanotube (AFM-CNT) and high resolution scanning electron microscopy (SEM). UV-6 has been exposed using next generation lithography (NGL) tools such as extreme ultra-violet (EUVL), electron beam (EBL), and X-ray (XRL). Then the LER behaviors were compared using AFM-CNT and SEM as metrology tools and we conclude that metrology tools should be selected more carefully for specific applications.

Published in:

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Date of Conference:

6-8 Nov. 2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.