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Changes in stress and coercivity after annealing of amorphous Co(Zr, Nb) thin films deposited by RF sputtering

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4 Author(s)
A. Materne ; CEA/IRDI/BP, Grenoble, France ; H. Moriceau ; B. Blanchard ; J. Florestan

The variations of the coercivity and the stress of low-magnetostriction Co(Zr, Nb) thin films are investigated, for various values of the sputtering gas pressure, PAr, before and after annealing at 300 degrees C. The origin of the stresses and their implications for the coercivity and the anisotropy are discussed on the basis of inert gas incorporation, morphological features, and relaxation effects.

Published in:

IEEE Transactions on Magnetics  (Volume:24 ,  Issue: 2 )