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Computer aided synthesis of an IC electrical diagram from mask data

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1 Author(s)
Le Carpentier, J. ; RTC-La Radiotechnique-Compelec, Caen, France

A method affording computerized checking of IC layouts and comparisons with electrical design before commitment to mask making, will be described. Advantages include reduction of development delays and resultant costs.

Published in:
Solid-State Circuits Conference. Digest of Technical Papers. 1975 IEEE International  (Volume:XVIII )

Date of Conference: Feb 1975

Page(s):
84 - 85
Digital Object Identifier :
10.1109/ISSCC.1975.1155459
Product Type:
Conference Publications

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