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Application of mechanical-technology CAD to microelectronic device design and manufacturing

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6 Author(s)
Maseeh, F. ; Microsyst. Technol. Lab., MIT, Cambridge, MA, USA ; Harris, R.M. ; Boning, D.S. ; Heytens, M.L.
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A computer-aided-design (CAD) architecture for microelectromechanical systems is presented in which conventional mask layout and process simulation tools are linked to three-dimensional mechanical CAD and finite-element tools for analysis and simulation. The architecture is exercised at an elementary level by modeling the first steps of the MIT baseline CMOS process. An architecture for an object-oriented material property simulator is shown in which material properties and their process dependence are stored and are accessed based on the specific process conditions

Published in:

Electronic Manufacturing Technology Symposium, 1990 Proceedings, Competitive Manufacturing for the Next Decade. IEMT Symposium, Ninth IEEE/CHMT International

Date of Conference:

1-3 Oct 1990