Application of mechanical-technology CAD to microelectronic device design and manufacturing

A computer-aided-design (CAD) architecture for microelectromechanical systems is presented in which conventional mask layout and process simulation tools are linked to three-dimensional mechanical CAD and finite-element tools for analysis and simulation. The architecture is exercised at an elementary level by modeling the first steps of the MIT baseline CMOS process. An architecture for an object-oriented material property simulator is shown in which material properties and their process dependence are stored and are accessed based on the specific process conditions.<
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