Notification:
We are currently experiencing intermittent issues impacting performance. We apologize for the inconvenience.
By Topic

Application of mechanical-technology CAD to microelectronic device design and manufacturing

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Maseeh, F. ; Microsyst. Technol. Lab., MIT, Cambridge, MA, USA ; Harris, R.M. ; Boning, D.S. ; Heytens, M.L.
more authors

A computer-aided-design (CAD) architecture for microelectromechanical systems is presented in which conventional mask layout and process simulation tools are linked to three-dimensional mechanical CAD and finite-element tools for analysis and simulation. The architecture is exercised at an elementary level by modeling the first steps of the MIT baseline CMOS process. An architecture for an object-oriented material property simulator is shown in which material properties and their process dependence are stored and are accessed based on the specific process conditions

Published in:

Electronic Manufacturing Technology Symposium, 1990 Proceedings, Competitive Manufacturing for the Next Decade. IEMT Symposium, Ninth IEEE/CHMT International

Date of Conference:

1-3 Oct 1990