Skip to Main Content
Use is made of an existing technique to synthesize a sum pattern whose sidelobe peaks fit a prescribed envelope in a specified segment of the visible region. In terms of a polynomial representation of the pattern, certain roots are then displaced radially off the unit circle to achieve null-filling. The result is a shaped beam with low, equal-percentage ripple, and sidelobe heights in the nonshaped region that are individually controlled. The procedure is illustrated for a linear array, designed to produce a pattern.