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Properties of Hafnium Dioxide Thin-Film Capacitors

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2 Author(s)
Huber, F. ; Bell Labs,Pa ; Huber, F.

Dielectric films of anodically formed HfO2based on Hf films of different degrees of orientation as well as reactively sputtered HfO2films were studied. The anodic oxide grown on oriented Hf films and the reactively sputtered HfO2films were monoclinic and showed partial orientation with the

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Parts, Hybrids, and Packaging, IEEE Transactions on  (Volume:7 ,  Issue: 4 )