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Heat Transfer of Modified Silicon Surfaces

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2 Author(s)
M. Reeber ; IBM Data Systems Div. ; R. Frieser

The heat transfer between silicon surfaces and perfluorohexane has been measured for fluxes ranging from 0 to 2.2 W/cm2. Data are presented for ten different surface treatments designed to encourage thermal nucleation.

Published in:

IEEE Transactions on Components, Hybrids, and Manufacturing Technology  (Volume:3 ,  Issue: 3 )