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Theory and Practice of MOS Processing Techniques-1973

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2 Author(s)
Kmeta, W. ; SMC Microsystems Corp.,Hauppauge, NY ; Nadan, J.S.

Current industrial practice and theory applicable to the fabrication of low-voltage p-channel metal-oxide-semiconductor (PMOS) devices is summarized. An extensive bibliography and design parameter graphs are presented.

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Manufacturing Technology, IEEE Transactions on  (Volume:2 ,  Issue: 2 )