Cart (Loading....) | Create Account
Close category search window
 

Dielectric Properties of Thin Insulating Films of Photoresist Material

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Pierce, J.T. ; Texas Instruments Incorporated ; Pritchard, J.P., Jr.

This paper discusses measurements of the dielectric properties of thin insulating films of AZ-171and KPR.2The properties include conductivity and dielectric constant as a function of frequency, voltage, and temperature. Also, films have been temperature cycled from 3° to 500° K to determine if structural defects appear. These measurements show that specially prepared films are suitable as large area insulators for fabricating multilayer film circuits. To illustrate the advantages of using photoresist films for both insulator and etch resist, a brief description of a process for fabricating cryotrons will be presented.

Published in:

Component Parts, IEEE Transactions on  (Volume:12 ,  Issue: 1 )

Date of Publication:

Mar 1965

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.