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A preliminary study of automated inspection of VLSI resist patterns

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5 Author(s)
Li, C.C. ; University of Pittsburgh, Pittsburgh, PA ; Mancuso, J.F. ; Shu, D.B. ; Sun, Y.N.
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This paper presents our progress on automated inspection of VLSI resist patterns as imaged by scanning electron microscopy. A precision digital edge line detection method has been developed for extracting edge contours of resist lines of submicron width, which are crucial for micro registration and detection of defects including bubbles and holes, resist stringers and resist edge defects.

Published in:

Robotics and Automation. Proceedings. 1985 IEEE International Conference on  (Volume:2 )

Date of Conference:

Mar 1985