Cart (Loading....) | Create Account
Close category search window

An analytical two-dimensional simulation for the GaAs MESFET drain-induced barrier lowering: a short-channel effect

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Chang, Chian-Sern ; Avantek Inc., Santa Clara, CA, USA ; Day, D.-Y.S. ; Chan, S.

An analytic model for simulating the GaAs MESFET drain-induced barrier lowering and its effect on device performance are discussed. The potential barrier between the source and drain of a field-effect transistor in or near the subthreshold region is lowered by increasing the drain voltage. As the barrier is lowered to be comparable to the thermal energy, an appreciable current will flow through the channel, and the device will begin to conduct. This effect causes the threshold-voltage-control problem and degrades the device performance

Published in:

Electron Devices, IEEE Transactions on  (Volume:37 ,  Issue: 5 )

Date of Publication:

May 1990

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.