By Topic

Kinetically tailored properties of electron-beam excited XeF(C → A) and XeF(B → X) laser media using an Ar-Kr buffer mixture

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Nighan, W. ; United Technologies Research Center, East Hartford, CT, USA ; Sauerbrey, R. ; Yunping Zhu ; Tittel, F.K.
more authors

Use of a two-component buffer gas comprised of Ar and Kr results in electron-beam excited XeF( C \rightarrow A ) laser pulse energy and intrinsic efficiency values comparable to those of UV rare gas-halide lasers. Herein we report measurements of transient absorption confirming that the primary effect of a buffer comprised of Ar and Kr is a significantly lower level of ionized and excited species that absorb in the blue-green spectral region. Spectral analysis of a variety of mixtures shows that the Ar-Kr buffer also benefits XeF( C \rightarrow A ) laser performance due to an increase in gain in the 400-450 nm region caused by the presence of the Kr2F excimer. In addition, a large increase in absorption at ∼ 351 nm, also due to Kr2F, suppresses oscillation on the competitive XeF( B \rightarrow X ) transition and, for certain conditions, makes efficient simultaneous oscillation of the XeF( B \rightarrow X ) and XeF( C \rightarrow A ) laser transitions possible.

Published in:

Quantum Electronics, IEEE Journal of  (Volume:23 ,  Issue: 2 )