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Theoretical simulation of electron-beam-excited xenon-chloride (XeCl) lasers

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4 Author(s)
F. Kannari ; Dept. of Engin., Faculty of Science and Technology, Keio University, Yokohama, Japan ; A. Suda ; M. Obara ; T. Fujioka

By developing a comprehensive computer code for e -beam excited XeCl lasers, we studied mainly the effect of Ar and Ne diluents on the performance characteristics of XeCl lasers. According to the analysis of the XeCl* formation process, the XeCl* relaxation process, and the 308 nm absorption process, it is found that the XeCl* formation efficiency is determined mainly by the rate of the charge transfer process (from Ar+ and Ne+ diluent ions to Xe+); in other words, by the difference between ionic potentials of Xe and the diluent gas used. The extraction efficiency is found to be decided mainly by the quenching rate of a three-body reaction for a short-pulse (55 ns) and a high-excitation-rate (∼ 3 MW/cm3) pumping, and by the absorption process for a long-pulse (500 ns) and a low-excitation-rate (∼ 0.2 MW/cm3) pumping. However, note that no appreciable difference in the intrinsic efficiency is found between the Ar/Xe/HCl and Ne/Xe/HCl mixtures. We also analyzed the dependence of the intrinsic XeCl laser efficiency on the pumping pulse width and excitation rate for Ar/Xe/HCl and Ne/Xe/HCl mixtures. As a result, the same intrinsic efficiencies are obtainable for both Ar- and Ne-based mixtures although the optimum operating conditions are slightly different. The maximum intrinsic efficiency of 5 percent is obtainable both for the Ar/Xe/HCl mixture at 3 atm and with 1.5 MW/cm3, 200 ns (FWHM) pumping and for the Ne/Xe/HCl mixture at 4 atm and with 2 MW/cm3, 200 ns (FWHM) pumping.

Published in:

IEEE Journal of Quantum Electronics  (Volume:19 ,  Issue: 10 )