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Laser microphotochemistry for use in solid-state electronics

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3 Author(s)
Ehrlich, D. ; MIT, Lexington, MA, USA ; Osgood, R.M. ; Deutsch, T.

A focused, ultraviolet (UV) laser beam has been used to produce micrometer-sized chemical processes on solid surfaces. These processes are initiated by the photodissociatlon of a molecular gas in the vicinity of the gas-solid interface. Depending on whether the active photofragment reacts with or is adsorbed on the solid, microetching or microdeposition occurs. Both the surface properties of the solid and the gas-phase kinetics contribute to the process localization. Metal alkyls and methyl halides have been used as parent molecules for deposition and etching, respectively. A focused, 3 mW UV laser is sufficiently intense to produce satisfactory rates for both processes. Several applications of this small-scale photochemistry to microelectronics have been investigated.

Published in:

Quantum Electronics, IEEE Journal of  (Volume:16 ,  Issue: 11 )