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2-kHz repetition rate XeF laser

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2 Author(s)
Wang, C. ; The Aerospace Corporation, Los Angeles, CA, USA ; Gibb, O.

High-repetition-rate laser action, up to 2 kHz, has been demonstrated in XeF molecules at 351 and 353 nm by using a blowdown fast transverse-flow system and a four-circuit, thyratron-switched, low inductance pulse generator. For a typical run, the transverse flow was uniform, and the average flow velocity was 25 m/s across a discharge region of 1.4 \times 0.4 \times 30 cm3. The gas mixture used was He:Xe:NF3= 100:1.5:0.5, and the total pressure was varied from 600-1200 torr. For single-pulse operation, the maximum laser output energy was 22 mJ/pulse, and the electric efficiency was 0.4 percent. For a 2-kHz repetition rate, the average laser output energy was approximately 12 mJ/pulse with 50 percent variations. Hence, an average output power of 24 W was obtained.

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Quantum Electronics, IEEE Journal of  (Volume:15 ,  Issue: 5 )