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Two-dimensional profile of emissive species in a magnetized SiH4/Ar glow discharge for the scanning-plasma CVD method

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3 Author(s)
Kawasaki, H. ; Nagasaki Univ., Japan ; Matsuda, Y. ; Fujiyama, H.

In order to control reactive glow discharge plasmas, the authors have investigated a crossed magnetic field B perpendicular to the discharge electric field E. It was found that profiles of SiH* emission, had two peaks in both the negative glow region and the cathode sheath region. As a result of the modification of the plasma structure by the crossed magnetic field, subsequent modification of spatial profiles of optical emission from SiH and Ar were observed. The Hα emission in the cathode sheath region, were not much influenced by the crossed magnetic field. By applying a modulated magnetic field in AC discharge plasmas (scanning plasma method), time-averaged uniform profiles of both plasmas and SiH radicals could be realized near the substrate sustained outside the discharge region. The minimum inhomogeneities of both profiles were less than 2.5% for the magnetic flux density of several tenths of a gauss, in contrast with 15% for the condition of no magnetic field

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Plasma Science, IEEE Transactions on  (Volume:19 ,  Issue: 2 )