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Electron-beam exposure of optical gratings

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5 Author(s)
Yang, L. ; Cornell University, Ithaca, NY, USA ; Turner, J. ; Rhodes, L. ; Tang, C.
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Because of electron scattering, optimum exposure conditions for optical gratings written with a scanning electron microscope depend on the grating period. Experimentally determined exposure conditions are given for gratings of periods down to 230 nm deposited on both conducting and nonconducting substrates. Optimum exposures are shown to be in good agreement with theoretical predictions, but exposure latitude is less than predictions indicate.

Published in:

Quantum Electronics, IEEE Journal of  (Volume:10 ,  Issue: 3 )

Date of Publication:

Mar 1974

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