By Topic

Pulsed KrF laser annealing of blue emitting SrS:Cu,Ag thin films

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Liew, S.C. ; Centre For Creative Technol., Nottingham Trent Univ., UK ; Koutsogeorgis, D.C. ; Cranton, W.M. ; Thomas, C.B.

The first successful attempt at utilising pulsed KrF (248 nm) laser annealing as a post-deposition process for RF sputtered SrS:Cu,Ag phosphor films used for thin film electroluminescent (TFEL) devices is presented. Using this novel annealing method, the luminance of the TFEL devices is observed to improve as laser fluence increases. Hence, the potential for luminance improvement of SrS:Cu,Ag TFEL devices without the need for a high temperature annealing process is demonstrated.

Published in:

Electronics Letters  (Volume:38 ,  Issue: 23 )