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10 000 Å thick 80/20 Ni-Fe films were deposited by -beam evaporation on oxidized silicon wafers in a magnetic field. The dependencies of the internal stresses and of the magnetic properties on the substrate temperature and on the deposition rate were investigated. Measurements were done in the as deposited state and after a 5 h easy-axis anneal at 400°C. It turned out that both the magnetic properties and the internal stresses were strongly dependent on the kinetics of deposition. The observed field-induced magnetic anisotropy is entirely contributed to pair ordering. No interdependence between the uniaxial magnetic anisotropy and the internal stresses was found.