By Topic

Direct evidence for a two-magnon contribution to the FMR relaxation in Ni-Fe thin films

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
C. Patton ; Tohoku University, Sendai, Japan ; F. Ono ; M. Takahashi

An off-resonance technique, which permits the relaxation rate to be determined as a function of bias field, has been applied to Ni-Fe thin films for the first time. The data provide direct evidence for a strong two-magnon scattering contribution to the losses. The effective linewidth for a 1300-Å film at 9 GHz peaks near the parallel resonance position with \Delta (\omega /\gamma )_{eff}\approx 200 Oe. It decreases above and below the ferromagnetic resonance (FMR). \Delta (\omega /\gamma )_{eff} is reduced to 60 Oe at a bias 100 Oe below resonance. This sharp falloff indicates that the scattering is due to relatively large inhomogeneities, 3000Å or larger in size. The falloff above resonance is due to a decrease in both the density of states and coupling for the degenerate spin waves. The effective line shift due to spin-wave scattering is also strongly field dependent. It changes by more than 30 Oe in the vicinity of resonance. The data show that line-shift effects should completely obscure ripple field shifts (0.1-1 Oe) which can, in concept, be measured by FMR techniques.

Published in:

IEEE Transactions on Magnetics  (Volume:7 ,  Issue: 3 )