Cart (Loading....) | Create Account
Close category search window
 

Origin of interfacial energy in coupled films of permalloy and cobalt

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Hirsch, A.A. ; Technion-Israel Institute of Technology, Haifa, Israel. ; FRiedman, N.

The mechanism of magnetic coupling in multilayer films was investigated by analyzing the shape of the magnetoresistance hysteresis loops. A magnetic field was applied during the deposition of the layers in a high vacuum. Each film consisted of a soft layer of Ni-Fe and a hard layer of Co separated by intermediate laminations of SiO or Ag. The thickness of the intermediate lamination varied from 100 to about 5000 Å. The magnetoresistance hysteresis loop of the soft layer was displaced along the driving field axis. The displacement reaches a maximum value when the intermediate lamination has a thickness of about 700 Å and seems to be caused by a negative magnetic coupling. It was also found that the material of the intermediate lamination does not materially alter the characteristics of the films. Both phenomena were discussed in terms of magnetostatic interactions between uniaxial single-domain particles. The explanation for the interfacial energy based on long-range interactions points out that short-range interactions between the separated layers can be neglected.

Published in:

Magnetics, IEEE Transactions on  (Volume:5 ,  Issue: 3 )

Date of Publication:

Sep 1969

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.