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Dependence of segregated microstructure in sputter-deposited CoCr film on deposition conditions

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2 Author(s)
H. Masuya ; Sony Corporation Research Center, Hodogayaku, Yokohama, Japan ; H. Awano

The compositional segregation of sputter-deposited CoCr films prepared under substrate temperatures Ts of 90-160°C and Ar gas pressures PAr of 4-30 mTorr are studied by transmission electron microscopy. The segregated microstructure depends on Ts and PAr. The degree of the segregation increases as Ts increases, and is maximized at a medium PAr. Saturation magnetization increases as the degree of the segregation increases. Vertical coercivity in film with the same degree of the c-axis orientation increases as the degree of segregation increases.

Published in:

IEEE Transactions on Magnetics  (Volume:23 ,  Issue: 5 )