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Complementary permalloy bubble propagation structure

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3 Author(s)
I. Gergis ; Rockwell International, Anaheim, CA ; W. Lee ; C. Sallee

Field-access bubble propagation has been achieved in a novel Permalloy structure made up of a pattern and its complement. The pattern is defined by a step in a nonmagnetic spacer on top of which the Permalloy is deposited leaving the Permalloy in two levels. The two layers act in concert to provide coherently travelling potential wells for bubble propagation. The stepped structure is fabricated using a lift-off technique (4000-6000 Å) of Schott glass. Permalloy (1500-2500 Å) is then deposited by radio frequency sputtering over the entire device area. Devices of 10-μm period and 2- to 3-μm minimum feature were fabricated on 2-μm bubble garnets. A propagation margin >10 percent was obtained for 35-to 50-Oe drive fields.

Published in:

IEEE Transactions on Magnetics  (Volume:16 ,  Issue: 3 )